Engineered for large-area manufacturing operations, the Tahiti System balances the complex needs of high-volume performance and precise films in an economical package. This advanced ALD system ensures repeatable, exceptionally uniform, pinhole-free thin films on large Gen 4.5 substrates. Easy network integration into automation-driven facilities, low cycle times and a low cost of ownership make Tahiti the ALD system of choice for manufacturers worldwide.
Key features include:
- Patented chamber architecture that accommodates two stacked ALD process chambers for conconcurrent processing of two independent Gen 4.5 substrates (up to 730 x 920 mm) for optimized throughput
- Automation-ready features, include an ALD-specific pneumatic gate valve, high reliability lift pin mechanism, built-in sensors and on-board diagnostics
- Scalability to Gen 5 substrates and beyond
- Precise software control of process parameters, including temperature, flow and pressure, for delivery of accurate, defect-free coatings
- 4,000 hours Mean Time Between Failures (MTBF) for maximum uptime
- Patented ALD Shield™ vapor trap to prevent build-up of deposits and prohibit excess gases from being exhausted into the environment
- Low cost of ownership with reduced startup, operational and maintenance costs, plus off-the-shelf replacement parts and the lowest consumption of precursors
- Standard recipes and ALD materials readily available
- Comprehensive support and services worldwide from expert ALD team
- Industrial-grade hardware and software interlocks for added safety