Veeco is the leading ALD supplier to academic institutions and industrial customers worldwide, with over 530 ALD systems shipped for R&D and production.
Our Savannah® Thermal and Fiji® Plasma systems are the ALD platforms of choice for R&D and have been cited in more than 2,000 peer-reviewed academic papers. Our fully automated industrial solutions for high-volume manufacturing (HVM) ALD combine lowest cost-of-ownership, superior throughput, and the highest standards of quality. The proven Phoenix® platform is tailored to meet specific customer needs in terms of ALD process performance, wafer handling and throughput as well as flexible thermal management.
When you choose our equipment, you are backed by a passionate team of world-leading ALD researchers, users and proponents. Our skilled ALD scientists will bring the breadth and depth of experience to solve your toughest thin film challenges.
At Veeco-CNT our customers’ feedback is important to us. The following quotes are typical of some of the responses we get from the tool owners in response to our direct support line at [ALDsupport AT veeco DOT com].
Prof. Fokko Mulder
Materials for Energy Conversion and Storage Group (MECS)
Delft University of Technology
"Our colleagues with the Kavli Nanolab at Delft University reported great success working with the Fiji F200 for their nanotechnology R&D, and we are confident the system’s capabilities will also serve us well as we pursue new materials for sustainable energy applications. In particular, we were drawn to the world-class reputation, flexible PE-ALD system architecture, and excellent service and support backed by the technical expertise of Veeco’s ALD scientists. After evaluating different options, it proved the best platform to meet our advanced experimentation needs."
Prof. Miin-Jang Chen
Nanoelectronic and Nanophotonic Materials Laboratory (NNML)
National Taiwan University
"We have been working with the Savannah and Fiji ALD systems for over eight years and have found them to be excellent research tools. Our decision to move forward with our most recent purchase and to establish a collaborative relationship with Veeco was based on our confidence in the performance of these products and in the consistency of support we have always received from their staff over the years."
Prof. Gary Rubloff
Energy Frontier Research Center (EFRC)
University of Maryland
"The performance and flexibility of Veeco’s Fiji systems have driven our group's nano research since 2011. The role played by these systems has been critical in many of the advances made in Nanostructures for Electrical Energy Storage (NEES) and our DOE, Energy Frontier Research Center."
Prof. Neil Dasgupta
Department of Mechanical Engineering
University of Michigan
"Veeco’s ALD provided a significant boost to our research productivity, enabling us to make rapid advances in the field of surface and interfacial modification of energy conversion devices, including batteries, solar cells, and catalysts. The versatility of the ALD system to address the varied needs of our research program coupled with the depth of knowledge of their science and engineering team, has enabled us to move very quickly towards producing high-impact research."
At Veeco, we do not just build coating equipment. We are also ALD researchers, users and proponents. Our skilled team of ALD scientists is here to work with you to solve your thin film challenges.
Contact us to learn more.
One Company Now with Proven MOCVD, ALD, MBE, Lithography, Wet Etch & Clean, Laser Annealing & Melt, Ion Bean Deposition & Etch…
University Selects Veeco’s Fiji® F200 PE-ALD System to Explore the Properties of Advanced Materials for Energy Storage Solutions
