Ultratech/CNT: Leading ALD Research

ALD Systems

Ultratech/CambridgeNanotech offers a full suite of ALD systems for research and production applications. The affordable and reliable Savannah is a research workhorse. Fiji offers advanced experimentation capabilities such as plasma-enhanced ALD. Phoenix systems offer production ALD capacity.

Driving ALD Research

Ultratech/CNT is the leading ALD supplier to academic and industrial institutions worldwide, with hundreds of systems shipped for research and development. Our Savannah ALD system has been used to produce more than a thousand of peer-reviewed academic papers.

What our customers are saying

At Ultratech/CNT our customers’ feedback is important to us. The following quotes are typical of some of the responses we get from the tool owners in response to our direct support line at [ALDsupport AT ultratech DOT com].

ALD Expertise

Product and Process Support

At Ultratech/CNT, we do not just build coating equipment; we're also ALD researchers, users and proponents. Our skilled team of ALD scientists is here to work with you to solve your thin film challenges.

Ultratech Nanotechnology News

Visit us at the ALD 2016 Conference in Dublin, Ireland. We are in Booth 15

Attend our presentations:

Plasma enhanced atomic layer deposition of molybdenum nitride
Adam Bertuch*1, Brent Keller2, Ganesh Sundaram1, Jeffrey Grossman2
1Ultratech - Cambridge NanoTech, USA, 2Department of Material Science and Engineering, Massachusetts Institute of Technology, USA
Tuesday 26 July:  Plasma-enhanced deposition and etching  -  Tuesday 26 July 15:45-17:15

Controlling smoothness of thin platinum ALD films
Ritwik Bhatia*1, Ralf Heilmann2, Alexander Bruccoleri3, Brandon Chalifoux2
1Ultratech-Cambridge Nanotech, USA, 2Massachusetts Institute of Technology, USA, 3Izentis LLC, USA
Wednesday 27 JULY:  Noble metals  -  Wednesday 27 July 08:15-10:15

Novel method to achieve area selective ALD on copper metal vs. SiO2 using vapor-phase deposited SAMS
Laurent Lecordier*1, Silvia Armini2
1Ultratech Cambridge Nanotech, USA, 2Imec, Belgium
Tuesday 26 July:  Nucleation and area selective deposition 1  -  Tuesday 26 July 11:00-12:30

Plasma enhanced atomic layer deposition of superconducting NbN films
Mark Sowa*1, Yonas Yemane2, J Provine3, Fritz Prinz4
1Ultratech/CNT, USA, 2Stanford University, Department of Applied Physics, USA, 3Stanford University, Department of Electrical Engineering, USA, 4Stanford University, Department of Mechanical Engineering and Department of Materials Science and Engineering, USA
Tuesday 26 July:  Poster session 2  -  Tuesday 26 July 17:15-19:00