Cambridge NanoTech is the leading provider of ALD solutions for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. The Savannah series exemplifies these core competencies, making it the platform of choice for those doing ALD research and development. The system’s efficient use of precursors and power-saving features substantially reduce the cost of operating an ALD system.  

All Savannahs are equipped with high-speed, pneumatic pulse valves to enable our unique Exposure Mode™ for deposition on Ultra High Aspect Ratio substrates. This novel methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than 2000:1.

The Savannah is available in three configurations: the S100, S200 and S300, capable of  holding substrates of different sizes, up to 300mm for the S300. All come equipped with heated precursors lines,  with the option to add up to six precursor lines, all capable of handling gas, liquid, or solid precursors.