Fiji - Atomic Layer Deposition System

Fiji Atomic Layer Deposition System

Advanced Capabilities for Advanced Research

Fiji ALD System Fiji ALD precursor Fiji ALD precursor

Our Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The result is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.

Fiji ALD System
Fiji - the most versatile and performant ALD platform.

We applied advanced computational fluid dynamics analyses to optimize the Fiji reactor, heater, and trap geometry. The system’s intuitive interface makes it easy to monitor and change recipes and processes as needed.

Fiji's advanced features include:

  • Proprietary Chamber Turbo Pumping System
  • Improved Plasma Design
  • Ergonomic Operator Interface
  • In-Situ Ellipsometry
  • In-Situ Quart Crystal Microbalance
  • Integrated Ozone
  • Glove box Interface

The Fiji is available in several different configurations, including Dual Chamber and Load Lock. Each chamber can be configured with up to six precursor lines that can accommodate solid, liquid or gas precursors, and six plasma gas lines, offering significant experimental flexibility in a compact and affordable footprint.

 

Technical specifications

Operational Modes Continuous Mode™ (Traditional Thermal ALD)
Exposure Mode™ (High Aspect Ratio ALD)
Plasma Mode™ (Plasma-Enhanced ALD)
Substrate Size Up to 200 mm
Substrate Temperature 500°C 200mm substrate heater standard
800°C 100mm substrate heater optional
Deposition Uniformity 1 σ Uniformities
Thermal Al2O3 – 1.5%
Plasma Al2O3 – 1.5%
Precursors 4 precursor lines standard, up to 6 optional
Gas, liquid, or solid precursors individually heatable to 200°C
Industry standard high speed ALD valves (10ms minimum pulse time)
Widely available 50cc (25mL fill max) stainless steel precursor cylinders
Gases 100 sccm Ar precursor carrier gas MFC
200 sccm Ar plasma gas MFC
100 sccm N2 plasma gas MFC
100 sccm O2 plasma gas MFC
100 sccm H2 plasma gas MFC
Trap Integrated, heated, thin foil ALD trap
Compatibility Clean Room Class 100 Compatible
Compliance CE, TUV, FCC
Dimensions F200:
1600 x 715 x 1920 mm
F200 with load lock:
1845 x 715 x 1920 mm
Power 220-240 VAC, 4200 W per reactor (excludes pump)
Control Microsoft Windows™ 7 Laptop PC, LabView based system control
Vacuum Pump >50CFM dry pump required
Available or customer supplied
System Options Spectroscopic Ellipsometer Ports
Quartz Crystal Microbalance
RGA Port
Optical Emission Spectrometer
Wafer Plus
Ozone Generator
Low Vapor Pressure Deposition
Glove box Interface
Load Lock
 

Quotation and Financing

Quotation process and financing, as well as product support and maintenance.

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