Uniformity over large substrates, reproducibility, and low temperature deposition make ALD an ideal candidate for the next generation of large-scale manufacturing thin film technology.
Veeco has perfected ALD as a manufacturing-grade technology by scaling up the process and implementing it into automation lines and cluster tools around the world. Manufacturers that have integrated our ALD systems have seen increased product quality and reliability as well as decreased operating costs and a greener footprint as compared to previous coating technologies.
If you have production ALD needs, then our Phoenix® production ALD system is the right choice. Phoenix® is a batch ALD tool capable of holding a large number of substrates at one time. Its unique chamber design assures accurate films from batch to batch
With its long campaigns and enhanced serviceability, the Firebird™ HVM ALD system meets and exceeds your cost-of-ownership requirements from small batch pre-production evaluation all the way to ramped-up production. Providing throughputs up to 40,000 wafers a month, the Firebird™ combines best-in-class productivity, superior film performance and low cost of operation to meet your most demanding high-volume manufacturing needs for specialized wafer production.